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白井 肇 シライ ハジメ

所属部署名 理工学研究科 物質科学部門 電話番号
職名 教授 ■FAX番号
住所 埼玉県さいたま市桜区下大久保255 ■メールアドレス shirai@fms.saitama-u.ac.jp
■ホームページURL

プロフィール

兼担研究科・学部

工学部 機能材料工学科
オープンイノベーションセンター

研究分野

大面積電子および発光デバイス応用のためのシリコン薄
カーボンナノチューブの作製技術の開発

現在の研究課題

1)アモルファス,微結晶,ナノシリコン系薄膜の新規な形成技術の開発2)高密度マイクロ波プラズマCVD装置開発、3)太陽電池等大面積電子デバイス用半導体シリコン薄膜の高速形成と光電物性評価、4)分光エリプソメトリー、5)高密度プラズマCVD法によるカーボンナノチューブの作製

所属学会

所属学会
応用物理学会
電気学会
表面技術協会

学歴

出身大学院・研究科等
1988 , 東京工業大学 , 博士 , 総合理工学研究科 , 材料科学専攻
1985 , 東京工業大学 , 修士 , 総合理工学研究科 , 材料科学専攻
出身学校・専攻等(大学院を除く)
1983 , 東京理科大学 , 理学部 , 応用化学科 , 卒業
取得学位
工学博士 , 東京工業大学 , 非晶質Se,Si系薄膜の化学組成変調による光電変換特性の制御に関する研究(東京工業大学)

研究職歴等

研究職歴
1994 , 埼玉大学工学部助教授
1988 - 1994 , 東京工業大学大学院総合理工学研究科助手

研究活動業績

研究業績(著書・発表論文等)

著書
プラズマ応用科学
2010
太田直希、今村教嗣、清水宏一、小林知洋、白井肇

科学研究費補助金「新学術領域研究」平成22年度報告書
2010
白井肇

論文
Atmospheric-Pressure Argon Plasma Eatching of Spin-Coated 3,4-Polythlenedioxythiophene:Polystyrenesulfonic acid (PEDOT:PSS) Films for CupperPhtalocyanine (CuPc)/C60 Heterojunction Thin-Films Solar Cells
,Thin Solid Films:On line 2011
Tomohisa Ino, Tatsuya hayashi, Keiji Ueno, Hajime Shirai

Chemical Activity of Oxygen Atoms in Magnetron Sputter-Deposited ZnO Films during Film Growth
,Japan Journal of Applied Physics,50:8月号掲載 2011
Aya Morita, Fumiya Watanabe, Naoki Ohta, Hajime Shirai

Chemical activity of oxygen atoms in the magnetron sputter-depsoited ZnO film growth
,Journal of Non-crystalline Solids 2011
Fumiya Watanabe, Aya Morita, Hajime Shirai, Yasuhiko Fujii, Tatsuro Hanakane

Depth profile characterization of spin-coated 3,4-polyethylenedioxyiophene:polystyrensulfonic acid (PEDOT:PSS) films by spectrsocopic ellipsometry
,Physica Status Solidi:on line 2011
Tomohisa Ino, Keiji Ueno, Hajime Shirai

Depth Profile Characterization of Spin-Coated Poly(3,4-Ethlenedioxythiophene):Poly(styrene Sulfonic Acid) films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic Ellipsometry
,Japan Journal of Applied Physics:8月号掲載 2011
Tomohisa Ino, Tatsuya Hayashi, Keiji Ueno, Hajime Shirai

In-depth characterization of PEDOT:PSS films by Ar plasma etching
,Jounal of Non-Crystalline Solids 2011
Tomohisa Ino, Yoshiyuki Muramatsu, Takeshi Fukuda, Keiji Ueno, Hajime Shirai

Rapid thermal annealng of sputter-deposited ZnO/ZnON/ZnO multilayered structure
,Thin Solid Films 2011
F. Watanabe, A. Morita, H. Shirai. H. Fujii, H. Hanabishi

Rapid Thermal-Anenaling of ZnO:Al Films for Si Thin-Film Solar Cells
,Thin Solid Films:on line 2011
N. Ohta, D. Ohba, S. Sato, Z. Tang, H. Shimizu, H. Shirai

Rapid thermla annealing of sputter-deposited ZnO:Al films for microcrystalline Si thin-film solar cells
,Journal of Non-crystalline Solids 2011
Z. Tang, S.Sato, H, Koshino, H, Shirai, Y. Fujii, T. Hanakake

Real-time elliposmetric characterization of the initial growth stage of PEDOT:PSS films by electrospray deposition using DMF solvent solution
,Journal of Non-Crystalline Solids 2011
Tomohisa Ino, Takeshi Asano, Takeshi Fukuda, Keiji Ueno, Hajime Shirai

Real-Time Ellipsometric Characterization of the Initial Growth Stage of Poly(3.4-ethyrenedioxythiophene):Poly(styrene sulfonic acid) Films by Electrospray Deposition
,Japan Journal of Applied Physics,50:8月号掲載 2011
Tomohisa Ino, Takashi Asano, Takeshi Fukuda, Keiji Ueno, Hajime Shirai

RTA of ZnO:Al for Si thin-film solar cells
,PV Direct 2011
S. Satoh. Z. Tang, H. Koshino, H. Shirai

Surface chemistry of atmospheric-pressure argon plasma etched PEDOT:PSS films and it efect on the performance of organic thin-films solar cells
,Solar Enrgy Matter. & Sol. Cells 2011
T. Ino, T. Fukuda, K. Ueno, H. Shirai

Surface chemistry of the preferred (111) and (220) crystal oriented microcrystalline Si films by radio-frequency plasma-enhanced chemical vapor deposition
,Physica Status Solidii:on line 2011
Daisuke Ohba, Zeguo Tang, Hajime Shirai

プラズマナノ界面反応のその場観察
,文部科学省科学研究費補助金「新学術創生」平成22年度報告書 2011
白井肇

Chemical Activity of Oxygen Atoms in the MAgtetron Sputter-Deposited ZnO Films
,Thin Solid Films 2010
Aya Morita, Fumiya Watanabe, Hajime Shirai

Effect of atmsopherc-pressure and low-tempearture argon plasma treatment to the PEDOT:PSS on the cupper phtalocyanine/C60 heter-junction solar cells
American Institute of Physics,Applied Physics Letters 2010
T.Ino, T.Hayashi, R.Ishikawa, K.Ueno, H.Shirai

Local deposition of carbon containing SiOx synthesized using atmospheric pressure microplasma jet
Materials Research Society of Japan,Trans. Matter. Reseach of Japan (J-MRS),35(1):187-190 2010
Q.Pan, Y.Ding, H.Shirai

Local Deposition of Carbon Containing SiOx Synthesized Using Atmospheric Pressure Microplasma Jet
,Transactions of the Materials Reserach Society of Japan,35:187-190 2010
Qiang Pan, Yi Ding, Hajime Shirai

Real tiime monitoring of the crystalization process during the plasma annealing of amorphous silicon
WILEY,Phys. Status Solidi,A207(3):574-577 2010
N.Ohta, T.Imamura, H.Shimizu, T.Kobayashi, and H.Shirai

Real Time Monitoring of the Crystallization Process during the Plasma Annealing of Amorphous Silicon
,Physica Status Solidi,A207:574-577 2010
Naoki Ohta, Takuya Imamura, Hirokazu Shimizu, Tomohiro Kobayashi, Hajime Shirai

Role of Oxygen Atoms in the Growth of Magnetron Sputter-Deposited ZnO films
,Journal of Applied Physics,108:033521-8 2010
Jin Jie, Aya Morita, Hajime Shirai

Role of oxygen atoms in the magnetron sputter-deposited ZnO films
American Institute of Physics,Journal of Applied Physics,108(3):033521-033521-8 2010
Jin Jie, Aya Morita, Hajime Shirai

Si Thin-Film Solar Cells Fabricated by RF PE-CVD og Si3H8 and H2 Mixture on ZnO:Al
,Transactions of the Materials Reserach Society of Japan,35:617-620 2010
Daisuke Ohba, Chien Hui Lai, Shun-suke Sato, Zeguo Tang, Hajime Shirai

Solid-phase crystallization of amorphous silicon on ZnO:Al utilizing the radio-frequency thermal plasma jet for Si thin-film solar cells
American Institute of Physics,Journal of Applied Physics 2010
Daisuke Ohba, Zeguo Tang, Shun-suke Sato, Naoki Ohta, Hajime Shirai

Surface Chemistry of Preferentially (111) and (220) Crystal-Oriented Microcrsyatlline Siolicon Films by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition
,Japan Journal of Applied Physics,49:81402 2010
Daisuke Ohba, Chien-Hui Lai, Zeguo Tang, Hajime Shirai

Surface chemistry of the preferred (111) and (220) crystal oriented microcrystalline Si films by radio-frequency plasma-enhanced chemical vapor deposition
American Institute of Physics,Journal of Applied Physics 2010
Daisuke Ohba, Chien-Hui Lai, Zeguo Tang, Hajime Shirai

大気圧高周波熱プラズマトーチによるa-Siの結晶化機構
プラズマ応用科学会,プラズマ応用科学,A207:39-45 2010
太田直希、春田浩司、白井肇、清水宏一、小林知洋

Rapid crystallization of amorphous silicon utilizing a very-high-frequency microplasma jet for Si thin-film solar cells
Elsevier,Solar Energy Materials & Solar Cells,93(6/7):1154-1157 2009
J.K.Saha, K.Haruta, .Yeo,T.Kobayashi, and H.Shirai

White light emission from silicon oxycarbide films prepared by using atmospheric pressure microplasma jet
American Institute of Physics,Journal of Applied Physics,105(4):043515-1-4 2009
Y.Ding, H.Shirai

The characterization of radio-frequency discharge using electrolyte solution as one electrode at atmospheric pressure
,Journal of Physics D-Applied Physics,41(17):6 200809
Qiang Chen;Junshuai Li;Kenji Saito;Hajime Shirai

多結晶シリコン薄膜の結晶粒径および位置制御に関する研究
埼玉大学総合研究機構,総合研究機構研究プロジェクト研究成果報告書,第6号(平成19年度) 200809
白井 肇

多結晶シリコン薄膜の結晶粒径および位置制御に関する研究
埼玉大学総合研究機構,総合研究機構研究プロジェクト研究成果報告書,第6号(平成19年度) 200809
白井 肇

High-density microwave plasma-enhanced chemical vapor deposition of microcrystalline silicon from dichlorosilane
,Thin Solid Films,516(19):6585-6591 200808
N. Ohse;K. Hamada;J. K. Saha;T. Kobayashi;Y. Takemura;H. Shirai

Physicochemistry of the plasma-electrolyte solution interface
,Thin Solid Films,516(19):6688-6693 200808
Q. Chen;K. Saito;Y. Takemura;H. Shirai

Correlation between micro-roughness, surface chemistry, and performance of crystalline Si/amorphous Si : H : Cl hetero-junction solar cells
,Journal of Non-Crystalline Solids,354(19-25):2483-2487 200805
H. Matsui;T. Saito;J. K. Saha;H. Shirai

Microplasma discharge in ethanol solution: Characterization and its application to the synthesis of carbon microstructures
,Thin Solid Films,516(13):4435-4440 200805
Q. Chen;T. Kitamura;K. Saito;K. Haruta;Y. Yamano;T. Ishikawa;H. Shirai

Rapid crystallization of amorphous silicon utilizing a radio-frequency thermal plasma torch
,Journal of Non-Crystalline Solids,354(19-25):2333-2336 200805
K. Haruta;M. Ye;Y. Takemura;T. Kobayashi;T. Ishikawa;J. K. Saha;H. Shirai

Very-high-frequency thermal microplasma jet for the rapid crystallization of amorphous silicon
,Thin Solid Films,516(13):4456-4461 200805
H. Shirai;Y. Sakurai;M. Yeo;K. Haruta;T. Kobayashi;T. Ishikawa

Deposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor deposition
,Journal of Applied Physics,103(4):7 200802
Junshuai Li;Jinxiao Wang;Min Yin;Pingqi Gao;Deyan He;Qiang Chen;Yali Li;Hajime Shirai

大面積電子デバイス用基盤技術のための大気圧マイクロプラズマ処理装置の開発 : サブミリメーターからメートル級サイズまで
埼玉大学総合研究機構地域共同研究センター,第1回テクノ・カフェ : セミナー資料:1-2 200702
白井 肇

High-density microwave plasma of SiH4/H-2 for high rate growth of highly crystallized microcrystalline silicon films
EDP Sciences,EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS,33(3):153-159 200603
白井 肇

大気圧マイクロプラズマジェットの生成と制御に基づいた局所反応場の設計
埼玉大学総合研究機構,総合研究機構研究プロジェクト研究成果報告書,16年度 2005
白井 肇
Microplasma jet at atmospheric pressure : application to the rapid recrsytallization of a-Si

Formation of Self-Assembled Nanocrystalline Sillicon Dots by SiCl4/H2 RF Plasma-Enhanced Chemical Vapor Deposition
,Jpn. J. Appl. Phys.,40:L1214-1216 2001
Y.Fujimura, S.H.Jung, H.Shirai

Low Temperature Formation of Microcrystalline Silicon Films Using High-Density SiH4 Microwave Plasma.
,Thin Solid Films,386:261-266 2001
Y.Sakuma, H.Shirai, H. Liu, Y. Sakuma, H. Ueyama

Novel High-Density Microwave Plasma Utilizing an Internal Spoke Antenna for Fast Deposition of Microcrystalline Silicon Films.
,Jpn. J. Appl. Phys.,40:L701-704 2001
H.Shirai, K. Yoshino, G. Ohkawara, H. Ueyama,

学会発表
Detremining factor of the preferential crystal orientation of microcrystalline Si films by rf PE-CVD
薄膜Si太陽電池国際会議 201012
D. Ohaba, Z. Tang, H. Shirai

Effect of Ar plasma exposure to PEDOT:PSS films for CupC/C60 hetrojunction thin-film solar cells
薄膜Si太陽電池国際会議 201012
T. Ino, T. Hayashi, K. Ueno, H. Shirai

Crystallization of amorphous silicon utilizing a line plasma-scanning
The 17th International Display Workshops 17 (IDW17) 201012
N. Ohta, N. Imamura, H. Shimizu, T. Kobayashi, H. Shirai

Determining Factor of the preferred crystal orientation in the Microcrystalline Si TFTfrom PE-CVD of a SiH2Cl2 and H2 mixture
The 17th International Display Workshops (IDW17) 201012
Daisuke Ohba, Zeguo Tang, Hajime Shirai

Role of Oxygen atoms in the sputter-deposited ZnO films
The 17th International Display Workshops (IDW10) 201011
Aya Moroita, Fumiya Watanabe, Hajime Shirai

Chemical activity of oxygen atoms in the growth of suptter-deposited ZnO films
ICRP7 (France) 201010
Aya Morita, Fumiya Watanabe, Hajime Shirai

Real time monitoring of atmospheric-pressure plasma-PEDOT:PSS interface by spectroscopic ellipsometry
ICRP7 201010
T. Ino, T. Hayashi, Y. Muramatsu, R. Ishiklawa, H. Shirai

Surafce chemistry of the preferred (111) and (220) crystal oriented microcrystalline Si films by rf PE-CVD
ICRP7 (France) 201010
Daisukle Ohba, Zeguo Tang, Hajime Shirai

Effect of atmospheric-pressure low-frequency plasma tretament to the PEDOT:PSS layer on the CuPc/C60 heterojunction solar cells
The 10th Asia Pacific COnferenece on Plasma Sicence abd Technoogy and the 23rd Symposium ob Plasma Science for Meterials(APCPST and SPSM),2010-271:508 201007
Tatsuya Ino, Tomohisa Ino, Ryou Ishikawa, Keiji Ueno, Hajime Shirai

Sputter-depsoited ZnO films with aid of chemical activity of oxygen atoms
The 10th Asia Pacific COnferenece on Plasma Sicence abd Technoogy and the 23rd Symposium ob Plasma Science for Meterials(APCPST and SPSM),2010-211:463 201007
Aya Morita and Hajime Shirai

Surface chemistry of the preferred (111) and (220) crystal oriented microcrystalline silicon by rf PE-CVD ofr Si thin-films solar cells
The 10th Asia Pacific COnferenece on Plasma Sicence abd Technoogy and the 23rd Symposium ob Plasma Science for Meterials(APCPST and SPSM),2010-210 201007
Zeguo Tang, Daisule Ohba, and Hajime Shirai

Si3H8プラズマCVDによるSi薄膜形成
プラズマプロセシング研究会 201002
大場大輔、Tang、白井肇

スパッタZnO薄膜形成時における酸素原子の役割
プラズマプロセシング研究会 201002
森田彩、金ケツ、白井肇

大気圧マイクロプラズマジェットによるSiOx、ZnO膜の局所合成
プラズマプロセシング研究会 201002
Q.Pan、Y.Dien、白井肇

Local deposition of SiO and ZnO utizilizing an atmospheric-pressure microplasma jet
The 16th International Display Workshops (IDW'09) 200912
Q.Pan, Y.Dien and H.Shirai

Microcrystalline silicon from a SiH2Cl2-H2 mixture using a high-density microwave plasma source utilizing a spoke antenna
The 16th International Display Worshops (IDW'09) 200912
H.Shirai, K.Hamada, and H.Matsui

Rapid crystallization of amorphous silicon utilzing the linear line plasma source
The 16th International Display Worshops (IDW'09) 200912
N.Ohta, Y.Imamura, and H.Shirai

High-density microwave plasma CVD of Si films for thin-film solar cells
Asian-European Int. Conf. on Plasma Surface Engineering Conf. 200909
Hajime Shirai

Microplasma CVD of SiOx at atmospheric pressure
ICANS23 200908
Y.Dien and H.Shirai

Real time monitoring of the rapid annealing of amorphous silicon utilizing thermla plasma jet
23rd International Conf. Amorphous and Nanocrystalline Semiconductors (ICANS23) 200908
N.Ohta, Y.Imamura, and H.Shirai

スパッタ法によるZnO薄膜作成における酸素原子の役割
応用物理学会,第57回応用物理学学術講演会 2009
金ケツ、森田彩、白井肇

大気圧プラズマジェットによるa-Siの結晶化過程
応用物理学会,第70回応用物理学術講演会 2009
太田直希、今村教嗣、白井肇

大気圧ラインプラズマによるa-Si結晶化
応用物理学会,第 回応用物理学学術講演会 2009
今村教嗣、太田直希、白井肇

教育活動実績

授業等

薄膜・表面工学(工学部)
物性計測(工学部)
機能デバイス(工学部)
機能材料工学実験Ⅲ(工学部)
工学基礎実験(工学部)
薄膜・表面工学特論(院・理工学前期)
電子機能デバイス工学特論(院・理工学前期)
半導体プロセス特論(院・理工学後期)